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A novel characterization tool for the study of dielectric breakdown of ultra-thin oxide MOS structures
Basso, Giovanni; Crupi, Felice; Neri, Bruno; Giannetti, Romano; Lombardo, Salvo (Sin editorial (Venecia, Italia), 24/05/1999)Dielectric breakdown of ultra-thin oxide MOS structures of integrated circuits is preceded by a precursory stage characterized by random on-off fluctuations of the current tunneling through the oxide. In this paper a new ...