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Special issue on surfaces patterned by ion sputtering
dc.contributor.author | Muñoz García, J. | es-ES |
dc.contributor.author | Cuerno Rejado, Rodolfo | es-ES |
dc.contributor.author | Castro Ponce, Mario | es-ES |
dc.contributor.author | Vázquez Burgos, Luís Fernando | es-ES |
dc.contributor.author | Gago Fernández, Raúl | es-ES |
dc.contributor.author | Redondo Cubero, Andrés | es-ES |
dc.date.accessioned | 2018-11-01T04:14:04Z | |
dc.date.available | 2018-11-01T04:14:04Z | |
dc.date.issued | 2018-11-14 | es_ES |
dc.identifier.issn | 0953-8984 | es_ES |
dc.identifier.uri | https:doi.org10.10881361-648Xaae608 | es_ES |
dc.description | Artículos en revistas | es_ES |
dc.description.abstract | es-ES | |
dc.description.abstract | Scalable nanostructuring of surfaces using ion beam sputtering (IBS) is a versatile alternative to traditional lithography. Semiconductors, metals or compounds are amenable for IBS where different patterns can be obtained by tuning the experimental setup. This special issue addresses this problem in a wide range of topics, from a basic understanding of the physical mechanisms operating at the nanoscale, to practical applications, with a synergetic approach coming from theoretical as well as experimental groups. | en-GB |
dc.format.mimetype | application/pdf | es_ES |
dc.language.iso | en-GB | es_ES |
dc.rights | es_ES | |
dc.rights.uri | es_ES | |
dc.source | Revista: Journal of Physics: Condensed Matter, Periodo: 1, Volumen: online, Número: 45, Página inicial: 450301-1, Página final: 450301-3 | es_ES |
dc.subject.other | Instituto de Investigación Tecnológica (IIT) | es_ES |
dc.title | Special issue on surfaces patterned by ion sputtering | es_ES |
dc.type | info:eu-repo/semantics/article | es_ES |
dc.description.version | info:eu-repo/semantics/publishedVersion | es_ES |
dc.rights.holder | es_ES | |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | es_ES |
dc.keywords | es-ES | |
dc.keywords | en-GB |
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