Special issue on surfaces patterned by ion sputtering

dc.contributor.author	Muñoz García, Javier	es-ES
dc.date.accessioned	2018-11-01T04:14:04Z
dc.date.available	2018-11-01T04:14:04Z
dc.date.issued	2018-11-14
dc.description	Artículos en revistas
dc.description.abstract	Scalable nanostructuring of surfaces using ion beam sputtering (IBS) is a versatile alternative to traditional lithography. Semiconductors, metals or compounds are amenable for IBS where different patterns can be obtained by tuning the experimental setup. This special issue addresses this problem in a wide range of topics, from a basic understanding of the physical mechanisms operating at the nanoscale, to practical applications, with a synergetic approach coming from theoretical as well as experimental groups.	es-ES
dc.description.version	info:eu-repo/semantics/publishedVersion
dc.format.mimetype	application/pdf	es_ES
dc.identifier.issn	0953-8984
dc.identifier.uri	https://doi.org/10.1088/1361-648X/aae608
dc.keywords		es-ES
dc.keywords		en-GB
dc.language.iso	en-GB
dc.rights		es_ES
dc.rights.accessRights	info:eu-repo/semantics/openAccess
dc.rights.holder		es_ES
dc.rights.uri		es_ES
dc.source	Revista: Journal of Physics: Condensed Matter, Periodo: 1, Volumen: online, Número: 45, Página inicial: 450301, Página final: 0
dc.subject.other	Instituto de Investigación Tecnológica (IIT)
dc.title	Special issue on surfaces patterned by ion sputtering
dc.type	info:eu-repo/semantics/article