Por favor, use este identificador para citar o enlazar este ítem:
http://hdl.handle.net/11531/7741
Registro completo de metadatos
Campo DC | Valor | Lengua/Idioma |
---|---|---|
dc.contributor.author | Gago Fernández, Raúl | es-ES |
dc.contributor.author | Vázquez Burgos, Luís Fernando | es-ES |
dc.contributor.author | Plantevin, O. | es-ES |
dc.contributor.author | Metzger, T.H. | es-ES |
dc.contributor.author | Muñoz García, J. | es-ES |
dc.contributor.author | Cuerno Rejado, Rodolfo | es-ES |
dc.contributor.author | Castro Ponce, Mario | es-ES |
dc.date.accessioned | 2016-05-23T03:06:43Z | - |
dc.date.available | 2016-05-23T03:06:43Z | - |
dc.date.issued | 2008-06-09 | es_ES |
dc.identifier.issn | 0003-6951 | es_ES |
dc.identifier.uri | https:doi.org10.10631.2398916 | es_ES |
dc.description | Artículos en revistas | es_ES |
dc.description.abstract | es-ES | |
dc.description.abstract | The temporal evolution of the characteristic wavelength (lambda) and ordering range (xi) of self-organized nanodot patterns induced during Ar%2B ion beam sputtering on Si(001) and Si(111) surfaces is studied by atomic force microscopy and grazing incidence x-ray diffraction. The patterns exhibit initial coarsening of lambda (up to 54-60 nm) and increase in xi (up to 400-500 nm) after which both features stabilize. The pattern formation is only weakly controlled by the crystallographic surface orientation, Si(111) surfaces showing a faster evolution into a proper stationary state. This trend is attributed to a higher sputtering rate at this orientation, as confirmed by theoretical simulations. (c) 2006 American Institute of Physics. | en-GB |
dc.format.mimetype | application/pdf | es_ES |
dc.language.iso | en-GB | es_ES |
dc.rights | es_ES | |
dc.rights.uri | es_ES | |
dc.source | Revista: Applied Physics Letters, Periodo: 1, Volumen: online, Número: 23, Página inicial: 233101.1, Página final: 233101.3 | es_ES |
dc.subject.other | Instituto de Investigación Tecnológica (IIT) | es_ES |
dc.title | Order enhancement and coarsening of self-organized silicon nanodot patterns induced by ion-beam sputtering | es_ES |
dc.type | info:eu-repo/semantics/article | es_ES |
dc.description.version | info:eu-repo/semantics/publishedVersion | es_ES |
dc.rights.accessRights | info:eu-repo/semantics/restrictedAccess | es_ES |
dc.keywords | es-ES | |
dc.keywords | surfaces, erosion, dots | en-GB |
dc.identifier.doi | 10.1063/1.2398916 | es_ES |
Aparece en las colecciones: | Artículos |
Ficheros en este ítem:
Fichero | Descripción | Tamaño | Formato | |
---|---|---|---|---|
IIT-06-095A.pdf | 225,57 kB | Adobe PDF | Visualizar/Abrir Request a copy |
Los ítems de DSpace están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.